Mask 3M serie 4277 FFABE1P3D

3M Mask 4277. Organic Vapours, Inorganic and Acid Gases up to 10 x TLV or 1000 ppm, whichever is lower. Particulates up to 20 x TLV. Use of many solvents (Xylene, MEK, Toluene...) Use of Chlorine, Bleach, Hydrogen Chloride, Sulphur Dioxide, Hydrogen Sulphide....